NDLI: Proton beam writing a platform technology for high quality three-dimensional metal mold fabrication for nanofluidic applications

Content Provider	Springer Nature Link
Author	Kan, J. A. Shao, P. G. Wang, Y. H. Malar, P.
Copyright Year	2011
Abstract	Direct write nanolithographic techniques are powerful techniques to fabricate masters for nano-imprint lithography (NIL). Proton beam writing (PBW) is a relatively new technique which has shown great potential in fabricating three-dimensional (3D) nanostructures in polymer resist material down to the 20 nm level. MeV protons generate secondary electrons and like in many lithographic processes these electrons modify the molecular structure of the resist. The energies of the proton induced secondary electrons are relatively low compared with secondary electrons generated using electron beam writing, therefore proton induced secondary electrons only modify resist material within several nano meters of the proton track. Since protons mainly interact with the substrate electrons the path of the proton beam is very straight, resulting in smooth and well defined resist structures with practically no proximity effects. Further development of current proton beam technology, required to approach sub 10 nm structuring with MeV protons is discussed. To explore the full micro- and nano-fabricating capabilities of PBW it is important to investigate potential new resist materials. In PBW mass production can be achieved through the fabrication of reliable molds and stamps. The compatibility of MeV proton beams for resist materials and post processing steps like electroplating and resist removal are evaluated. The second focus of this paper is PDMS nanofluidic lab on a chip sorting devices using high quality Ni molds. These molds have been prepared via PBW and Ni electroplating, a release layer on a Ni mold allows fine feature replication down to the 300 nm level with high aspect ratios in PDMS.
Starting Page	1519
Ending Page	1527
Page Count	9
File Format	PDF
ISSN	09467076
Journal	Microsystem Technologies
Volume Number	17
Issue Number	9
e-ISSN	14321858
Language	English
Publisher	Springer-Verlag
Publisher Date	2011-07-29
Publisher Place	Berlin, Heidelberg
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Electronics and Microelectronics, Instrumentation Mechanical Engineering Nanotechnology
Content Type	Text
Resource Type	Article
Subject	Nanoscience and Nanotechnology Condensed Matter Physics Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering Hardware and Architecture

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

Resist evaluation for proton beam writing, Ni mold fabrication and nano-replication

Proton beam writing a platform technology for high quality three-dimensional metal mold fabrication for nanofluidic applications

Proton beam writing: a platform technology for nanowire production

Ni electroplating on a resist micro-machined by proton beam writing

Fabrication of planar and three-dimensional microcoils on flexible substrates

Orthogonal and fine lithographic structures attained from the next generation proton beam writing facility

Fabrication of a freestanding micro mechanical structure using electroplated thick metal with a HAR SU-8 mold

Proton beam writing: a tool for high-aspect ratio mask production

A controllable liquid mold for fabrication of 3D spherical structures and arrays

Proton beam writing a platform technology for high quality three-dimensional metal mold fabrication for nanofluidic applications

Similar Documents

Resist evaluation for proton beam writing, Ni mold fabrication and nano-replication

Proton beam writing a platform technology for high quality three-dimensional metal mold fabrication for nanofluidic applications

Proton beam writing: a platform technology for nanowire production

Ni electroplating on a resist micro-machined by proton beam writing

Fabrication of planar and three-dimensional microcoils on flexible substrates

Orthogonal and fine lithographic structures attained from the next generation proton beam writing facility

Fabrication of a freestanding micro mechanical structure using electroplated thick metal with a HAR SU-8 mold

Proton beam writing: a tool for high-aspect ratio mask production

A controllable liquid mold for fabrication of 3D spherical structures and arrays

Proton beam writing a platform technology for high quality three-dimensional metal mold fabrication for nanofluidic applications