NDLI: Temperature-dependent characteristics of pulse-laser-deposited (Pb,Sr)TiO3 films at low temperatures

Content Provider	Springer Nature Link
Author	Wang, Jyh Liang Lai, Yi Sheng Chiou, Bi Shiou Chou, Chen Chia Lee, Trent Gwo Yann Tseng, Huai Yuan Jan, Chueh Kuei Cheng, Huang Chung
Copyright Year	2007
Abstract	Pulsed laser deposition (PLD) of (Pb,Sr)TiO3 (PSrT) film on Pt/SiO2/Si at low substrate temperatures (Ts), ranging from 300–450 °C, has been investigated. As Ts increases, the films reveal coarsening clusters, improved crystallization of the perovskite phase, distinct capacitance–electric field (C–E) hysteretic loops and a larger dielectric constant. The 350 °C-deposited film shows strong (100) preferred orientation and optimum dielectric properties with the dielectric constant of ∼620. The current density increases as the measurement temperature and the electric field increase. Moreover, PSrT films exhibit a strong negative temperature coefficient of resistance (NTCR) behavior at temperatures ranging from 100 to 390 °C.
Starting Page	129
Ending Page	134
Page Count	6
File Format	PDF
ISSN	09478396
Journal	Applied Physics A
Volume Number	90
Issue Number	1
e-ISSN	14320630
Language	English
Publisher	Springer-Verlag
Publisher Date	2007-08-18
Publisher Place	Berlin, Heidelberg
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Operating Procedures, Materials Treatment Surfaces and Interfaces, Thin Films Characterization and Evaluation of Materials Nanotechnology Optical and Electronic Materials Condensed Matter
Content Type	Text
Resource Type	Article
Subject	Chemistry Materials Science

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Temperature-dependent characteristics of pulse-laser-deposited (Pb,Sr)TiO3 films at low temperatures