NDLI: Sub-50 nm UV-curing nanoimprint based on fluoropolymer, CYTOP, mold

Content Provider	Springer Nature Link
Author	Bian, Jie Yang, Tao Yuan, Changsheng Ge, Haixiong Chen, Yanfeng
Copyright Year	2013
Abstract	In addition to the advantages of conventional fluoropolymers (i.e., chemical resistance, optical transparency, especially low surface energy), CYTOP, a commercially available cyclic fluoropolymer, can be dissolved in a special fluorinated solvent, thus it can be coated on the substrate by a spin-coating or solution casting method. In this paper, we introduced CYTOP as a rapid prototyping mold material for UV-curing nanoimprint lithography. The CYTOP mold is fabricated by a thermal nanoimprint technique on a quartz substrate or a direct solution casting on a master mold. Nanostructures with different geometries and down to sub-50 nm feature size are faithfully duplicated by CYTOP molds through a UV-curing imprint process. The CYTOP mold preserves its lower surface energy property after 20 repeated imprint cycles and there is no peeling off problem or contamination and damage on CYTOP mold observed. However, it is found that the high aspect ratio nanostructures on the CYTOP mold are tilted or deformed after separation with the master mold.
Starting Page	79
Ending Page	84
Page Count	6
File Format	PDF
ISSN	09478396
Journal	Applied Physics A
Volume Number	116
Issue Number	1
e-ISSN	14320630
Language	English
Publisher	Springer Berlin Heidelberg
Publisher Date	2013-11-21
Publisher Place	Berlin, Heidelberg
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Condensed Matter Physics Optical and Electronic Materials Nanotechnology Characterization and Evaluation of Materials Surfaces and Interfaces, Thin Films Operating Procedures, Materials Treatment
Content Type	Text
Resource Type	Article
Subject	Chemistry Materials Science

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