NDLI: Deposition of thin polytetrafluoroethylene (PTFE) films using fundamental pulses of a Nd3+: YAG laser

Content Provider	Springer Nature Link
Author	Tsuboi, Y. Kuro Oka, T. Irie, K. Itaya, A.
Copyright Year	2003
Abstract	Pulsed laser deposition of PTFE was carried out using a 1064-nm laser. Two different pulse regimes were examined to determine their effectiveness in causing deposition. The first of these consisted of a 20-ns Gaussian pulse, while the second was a pulse train comprising twenty 1-μs pulses with a total duration time of 100-μs. The main feature of the deposition technique that we present in this work is that ablation is induced by the efficient photothermal sensitization of graphite particles that are used to lightly dope (0.1 wt. %) a PTFE target. Both of the pulse regimes produced thin films whose infrared spectra were similar to that of PTFE. For the ns-pulse, however, carbon particles were contained in the deposited films. This behavior can be easily interpreted within the framework of photothermal ablation. For the μs pulse train, homogeneous heating is achieved due to the long thermal diffusion length, which is comparable to the average distance between the graphite particles used to dope the PTFE target. The thin PTFE films are deposited mainly by the mechanism of monomer re-polymerization. The present study demonstrates that near-infrared lasers of the μs-pulse type, which are versatile, economical and widely used in industry, are capable of the deposition of PTFE.
Starting Page	339
Ending Page	342
Page Count	4
File Format	PDF
ISSN	09478396
Journal	Applied Physics A
Volume Number	78
Issue Number	3
e-ISSN	14320630
Language	English
Publisher	Springer-Verlag
Publisher Date	2003-03-28
Publisher Place	Berlin, Heidelberg
Access Restriction	One Nation One Subscription (ONOS)
Content Type	Text
Resource Type	Article
Subject	Chemistry Materials Science

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