NDLI: Transparent conductive F-doped SnO2 films prepared by RF reactive magnetron sputtering at low substrate temperature

Content Provider	Springer Nature Link
Author	Zhu, B. L. Yang, Y. T. Hu, W. C. Wu, J. Gan, Z. H. Liu, J. Zeng, D. W. Xie, C. S.
Copyright Year	2017
Abstract	To obtain highly transparent conductive F-doped SnO2 films by magnetron sputtering at low substrate temperatures, a new method of sputtering high-density SnF2–Sn target in Ar + O2 atmosphere was adopted in the present study. The structural, electrical, and optical properties of the films prepared were investigated as a function of O2 flux. The results indicate that the films shows SnO2 phase only at O2 flux above a critical value (0.8 sccm), and the crystallinity of SnO2 phase is improved with increasing O2 flux. The resistivity of the films steeply decreases once O2 flux is above the critical value, but it greatly increases as O2 flux is too high. Only in intermediate range of O2 flux, the films with low resistivity can be obtained. As O2 flux is above the critical value, both the transmittances in visible light range and E g of the films show steeply increase, and the PL spectra of the film show distinct emission characteristics. Furthermore, the position and intensity of PL emission peaks are similar when O2 flux is above the critical value, and the emission mechanism can be attributed to electron transitions mediated by defect levels in the bandgap, such as V O and F O. Just because of formation of SnO2 phase in the films and existence of relatively larger amount of V O and F O, the films show low resistivity and high transmittance at suitable O2 fluxes.
Starting Page	1
Ending Page	9
Page Count	9
File Format	PDF
ISSN	09478396
Journal	Applied Physics A
Volume Number	123
Issue Number	4
e-ISSN	14320630
Language	English
Publisher	Springer Berlin Heidelberg
Publisher Date	2017-03-07
Publisher Place	Berlin, Heidelberg
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Condensed Matter Physics Optical and Electronic Materials Nanotechnology Characterization and Evaluation of Materials Surfaces and Interfaces, Thin Films Operating Procedures, Materials Treatment
Content Type	Text
Resource Type	Article
Subject	Chemistry Materials Science

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