NDLI: Pulsed laser deposition of molybdenum oxide thin films

Content Provider	Springer Nature Link
Author	Durrani, S. M. A. Al Kuhaili, M. F. Bakhtiari, I. A.
Copyright Year	2009
Abstract	Thin films of molybdenum oxide were deposited in vacuum by pulsed laser ablation using a xenon fluoride (351 nm) and a krypton fluoride (248 nm) excimer lasers. The films were deposited on unheated substrates and were post-annealed in air in the temperature range 300–500°C. The structural, morphological, chemical, and optical properties of the films were studied. As-deposited films were found to be dark. The transparency of the films was improved with annealing in air. The films were polycrystalline with diffraction peaks that belong to the orthorhombic phase of MoO3. The surface morphology of the films showed a layered structure. Both the grain size and surface roughness increased with annealing temperature. The stoichiometry of the films improved upon annealing in air, with the best stoichiometry of MoO2.95 obtained for films deposited by the XeF laser and annealed at 400°C. Similarly, the best transparency, with a transmittance exceeding 80%, was obtained with the films annealed in the temperature range 400–450°C.
Ending Page	615
Page Count	7
Starting Page	609
File Format	PDF
ISSN	09478396
e-ISSN	14320630
Journal	Applied Physics A
Issue Number	3
Volume Number	98
Language	English
Publisher	Springer-Verlag
Publisher Date	2009-10-10
Publisher Place	Berlin, Heidelberg
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Condensed Matter Physics Operating Procedures, Materials Treatment Optical and Electronic Materials Characterization and Evaluation of Materials Surfaces and Interfaces, Thin Films Nanotechnology
Content Type	Text
Resource Type	Article
Subject	Chemistry Materials Science

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