NDLI: Effect of chemical additive on fixed abrasive pad self-conditioning in CMP

Content Provider	Springer Nature Link
Author	Li, Jun Huang, Jiandong Xia, Lei Zhu, Yongwei Zuo, Dunwen
Copyright Year	2016
Abstract	Self-conditioning performance of polishing pad is an important characteristic to influence processing efficiency and service life in chemical mechanical polishing (CMP). The slurry can react with the pad surface, which affects its self-conditioning performance in fixed abrasive polishing process. Wear ratio of wafer material removal rate (MRR) and pad wear rate is introduced to evaluate self-conditioning performance of fixed abrasive pad (FAP). To clear the effect of chemical additive on FAP self-conditioning, wear ratio, FAP surface topography, friction coefficient, and acoustic emission signal of polishing process were investigated in fixed abrasive polishing of quartz glass with ferric nitrate, ethylenediamine (EDA), and triethanolamine (TEA) slurry, respectively. Results indicate that TEA slurry can provide excellent self-conditioning of FAP in fixed abrasive polishing of quartz glass. MRR and wear ratio maintain high levels during the whole polishing process. Friction coefficient and acoustic emission signal are more stable than that of the other two chemical additives. An appropriate amount of TEA, which is beneficial to enhance MRR and extends service life of FAP, is added in the polishing slurry to improve FAP self-conditioning in fixed abrasive polishing process.
Starting Page	107
Ending Page	113
Page Count	7
File Format	PDF
ISSN	02683768
Journal	The International Journal of Advanced Manufacturing Technology
Volume Number	88
Issue Number	1-4
e-ISSN	14333015
Language	English
Publisher	Springer London
Publisher Date	2016-04-20
Publisher Place	London
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Fixed abrasive polishing Wear ratio Fixed abrasive pad Self-conditioning Chemical additive Industrial and Production Engineering Media Management Mechanical Engineering Computer-Aided Engineering (CAD, CAE) and Design
Content Type	Text
Resource Type	Article
Subject	Industrial and Manufacturing Engineering Control and Systems Engineering Mechanical Engineering Computer Science Applications Software

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