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Low Delectric Insulating Filmi for Manufacturing Semconductor Device
| Content Provider | Semantic Scholar |
|---|---|
| Copyright Year | 2017 |
| Abstract | (57) ABSTRACT There is provided a damage recovery method capable of recovering electrical characteristics of a low dielectric insu lating film Sufficiently while Suppressing oxidation ofburied metal and generation of pattern defaults. A damaged functional group generated in a Surface of the low dielectric insulating film by a processing is substituted with a hydrophobic functional group (ST. 2). A damaged component present under a dense layer generated in the Surface of the low dielectric insulating film by the Substitution process is recov ered by using an ultraviolet heating process (ST. 3). |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | https://patentimages.storage.googleapis.com/14/65/de/88b42e3bd517b8/US8058153.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
