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Chapter 3 Atomic Layer Deposition on Self-Assembled-Monolayers
| Content Provider | Semantic Scholar |
|---|---|
| Author | Moshe, Hagay Mastai, Yitzhak |
| Copyright Year | 2013 |
| Abstract | Atomic layer deposition (ALD) is an advanced technique for growing thin film structures. ALD was developed by Tuomo Suntola and co workers in 1974. At first, the method was called Atomic layer epitaxy (ALE). However, today the name “ALD” is more common. The motiva‐ tion behind developing ALD was the desire to achieve a technique for creating thin film electroluminescent (TFEL) flat panel displays. [1][7] |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | http://cdn.intechopen.com/pdfs/44930/InTech-Atomic_layer_deposition_on_self_assembled_monolayers.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |