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The removal of the cefixime antibiotic from aqueous solution using an advanced oxidation process (UV/H2O2)
| Content Provider | Semantic Scholar |
|---|---|
| Author | Belghadr, Issa Khorramabadi, Ghodratollah Shams Godini, Hatam Almasian, Mohammad |
| Copyright Year | 2015 |
| Abstract | AbstractThe removal of cefixime from an aqueous solution was investigated via UV/H2O2 process. Aqueous solutions containing cefixime with concentrations of 9, 18, and 27 mg/L were produced. The UV/H2O2 process was conducted on the solutions in a laboratory reactor with a capacity of 5800 ml. The efficiency of the whole process was analyzed by comparing the concentrations of the antibiotic in the final effluents, taking into account such factors as the initial concentrations of the antibiotic (9, 18, and 27 mg/L), pH (3, 5, 7, and 9), retention time (0–180 min), different lamp voltages (12–36 W), and H2O2 concentrations (5–20 mg/L). The results of the study have shown that the UV/H2O2 process was able to remove 100% of a 9 mg/L concentration of cefixime from an aqueous solution in 3 h. The removal rates for cefixime were affected by parameters such as pH, the initial concentration of cefixime, the concentration of H2O2, and the intensity of UV radiations. Acidic pH (pH 3), low concentrations of cefixime (9... |
| Starting Page | 1068 |
| Ending Page | 1075 |
| Page Count | 8 |
| File Format | PDF HTM / HTML |
| DOI | 10.1080/19443994.2014.928799 |
| Volume Number | 55 |
| Alternate Webpage(s) | http://eprints.lums.ac.ir/193/1/17.pdf |
| Alternate Webpage(s) | https://www.deswater.com/DWT_abstracts/vol_55_4/55_4_2015_1068.pdf |
| Alternate Webpage(s) | https://doi.org/10.1080/19443994.2014.928799 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
