NDLI: Hydrogen and oxygen content of silicon nitride films prepared by multipolar plasma‐enhanced chemical vapor deposition

Content Provider	Semantic Scholar
Author	Boher, Pierre Renaud, Monique Jzendoorn, L. J. Van I. Hily, Yves
Copyright Year	1989
Abstract	Very low H content SiN films have been deposited by a multipolar plasma‐enhanced deposition system at room temperature. The main plasma parameters which control the hydrogen and oxygen incorporation in the films have also been analyzed and optimized.
Starting Page	511
Ending Page	513
Page Count	3
File Format	PDF HTM / HTML
DOI	10.1063/1.100915
Volume Number	54
Alternate Webpage(s)	https://pure.tue.nl/ws/files/1894165/Metis190839.pdf
Alternate Webpage(s)	https://doi.org/10.1063/1.100915
Language	English
Access Restriction	Open
Content Type	Text
Resource Type	Article

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