Perpendicular giant magnetoresistance in a 0.4 {mu}m diameter multilayer sensor

Content Provider	Semantic Scholar
Author	Spallas, James P. Huai, Yiming
Copyright Year	1996
Abstract	We have fabricated a novel GMR ML flux sensor that is designed to operate in the CPP mode. The GMR sensor is a 0.4 {mu}m diameter, 0.09 {mu}m high Cu-Co ML pedestal. The sensors are patterned using electron beam lithography. The Al{sub 2}O{sub 3}-TiC substrate is coated with a sputter deposited Al{sub 2}O{sub 3} film that is polished to <0.2 nm RMS roughness. Contact to the bottom of the GMR sensor is made by depositing the Cu-Co multilayers onto a smooth 0.45 {mu}m thick Mo-Si ML stack. The top contact is self-aligned to the GMR sensor. This is accomplished, in part, by CMP. The top and bottom contact layers are electrically isolated by a PECVD Si{sub 3}N{sub 4} film. The configuration of the contacts allows four point probe resistance measurements. The GMR response of these 0.4 {mu}m diameter sensors is 12%.
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Alternate Webpage(s)	https://digital.library.unt.edu/ark:/67531/metadc664497/m2/1/high_res_d/226400.pdf
Language	English
Access Restriction	Open
Content Type	Text
Resource Type	Article