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Dielectric Properties of Nickel Containing Hydrogenated Amorphous Carbon Films Prepared by Microwave Plasma-assisted Deposition Technique
| Content Provider | Semantic Scholar |
|---|---|
| Author | Sylvestre, A. Kukiełka, S. Gulbiński, W. Pauleau, Yves |
| Copyright Year | 2007 |
| Abstract | Nickel/hydrogenated amorphous carbon (a-C:H) composite films have been deposited at room temperature on nickel coated (100)-oriented single crystal silicon substrates by combining sputter-deposition of metal and microwave plasma-assisted chemical vapor deposition of carbon from argon-methane mixtures of various concentrations. The sputtering power was varied from 0 W to 45 W. The films have been deposited on either grounded substrates or substrates biased to - 10 V. The dielectric properties of films were investigated as functions of the frequency and temperature varying from 0.1 Hz to 1 MHz and from -150 °C to 175 °C, respectively. Pure a-C:H films exhibited a dielectric constant of 2.6 at a wide range of frequency. For Ni/a-C:H composite films of 360 nm in thickness containing 19% of nickel the dielectric constant at a frequency of 1 Hz was higher than 300. The value of the dielectric constant of these composite films was observed to decrease from above 300 to 200 as the frequency increased from 1 Hz to 10 kHz. The effect of temperature and frequency as well as nickel content in the films on the dielectric properties is discussed. |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | http://www.ipme.ru/e-journals/RAMS/no_31507/kukielka2.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
