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Fabrication of amorphous silicon nanoribbons by atomic force microscope tip induced local oxidation for thin film device applications
| Content Provider | Semantic Scholar |
|---|---|
| Author | Demami, Fouad |
| Copyright Year | 2016 |
| Abstract | We demonstrate the feasibility of induced local oxi dation of amorphous silicon by atomic force microscopy. The resulting local oxide is used as ma sk for the elaboration of thin film silicon resistor. A thin amorphous silicon layer deposited on a glass substrate is locally oxidized following narrow continuous lines. The corresponding oxide li n is then used as mask during plasma etching of the amorphous layer leading to the formation of nanoribbon. Such amorphous silicon nanoribbon is used for the fabrication of resistor. |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | https://hal.archives-ouvertes.fr/hal-00486628/document |
| Language | English |
| Access Restriction | Open |
| Subject Keyword | Atomic-force microscopy Microscope Device Component Nanoribbons Plasma etching Resistor Device Component Silicon Silicon:SCnt:Pt:Tiss:Qn Spectrophotometry, Atomic Absorption Substrate (electronics) oxidation |
| Content Type | Text |
| Resource Type | Article |
