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Adjustment of Exposure Kinetics Simulation Parameters for a 3-D Microstructure Fabrication Using Double-Exposure Lithography
| Content Provider | Semantic Scholar |
|---|---|
| Author | Atthi, Nithi Pholprasit, Patama Thammabut, Thawat Jeamsaksiri, Wutthinan Hruanun, C. Poyai, A. Silapunt, Rardchawadee |
| Copyright Year | 2011 |
| Abstract | This paper is focused on the adjustment of the Dill’s C parameter associated with the double exposure kinetics using trial-and-error with the regression statistic. Adjusted Dill’s C is used in the simulation to pattern a 3-step air bearing surface (ABS) structure. The result shows within 5.0% deviation of the remaining photoresist thickness from that of the experiment. |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | http://www.thaiscience.info/Article%20for%20ThaiScience/Article/2/10025157.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |