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Suitable photo-resists for two-photon polymerization using femtosecond fiber lasers
| Content Provider | Semantic Scholar |
|---|---|
| Author | Rajamanickam, Vijayakumar P. Ferrara, Lorenzo Toma, Andrea Zaccaria, Remo Proietti Das, Gobind Fabrizio, Enzo Di Liberale, Carlo |
| Copyright Year | 2014 |
| Abstract | We present suitable materials with good optical and mechanical properties, simple processing, efficient and optimized for two-photon polymerization (TPP) with femtosecond fiber lasers. We selected readily available acrylic monomer Bisphenol A ethoxylate diacrylate (BPA-EDA) with three different photo-initiators (PIs), isopropyl thioxanthone (ITX), 7-diethylamino-3-thenoylcoumarin (DETC), and 4,4' bis(diethylamino) benzophenone (BDEB), since their absorption spectra match well with the laser wavelength at 780nm. These PIs grant efficient radical generation, reactivity and high solubility in acrylic monomers. Finally, good optical and mechanical properties are demonstrated by the fabrication of different micro-structures. |
| Starting Page | 135 |
| Ending Page | 138 |
| Page Count | 4 |
| File Format | PDF HTM / HTML |
| DOI | 10.1016/j.mee.2014.04.040 |
| Volume Number | 121 |
| Alternate Webpage(s) | https://repository.kaust.edu.sa/bitstream/handle/10754/543734/2014_MEE_Suitable%20photoresist%20for%20two-photon%20polymerization%20using%20femtosecond%20fiber%20lasers.pdf;jsessionid=C54B7DAF65D9ABF19B8985BDA3154F89?sequence=1 |
| Alternate Webpage(s) | https://doi.org/10.1016/j.mee.2014.04.040 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
