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Implementation of simulation program for modeling the effective resistivity of nanometer scale film and line interconnects
| Content Provider | Semantic Scholar |
|---|---|
| Author | Yarimbiyik, A. Emre Schafft, Harry A. Allen, Richard A. Zaghloul, Mona E. Blackburn, David L. |
| Copyright Year | 2006 |
| Abstract | A computer program that simulates the impact of the size effect on the effective resistivity of line and film conductors is described. Flowcharts and the program code are provided as appendices. |
| File Format | PDF HTM / HTML |
| DOI | 10.1002/https://dx.doi.org/10.6028/NIST.IR.7234 |
| Alternate Webpage(s) | http://www.eeel.nist.gov/812/files/NISTIR%207234.pdf |
| Alternate Webpage(s) | https://ws680.nist.gov/publication/get_pdf.cfm?pub_id=32006 |
| Alternate Webpage(s) | https://nvlpubs.nist.gov/nistpubs/Legacy/IR/nistir7234.pdf |
| Alternate Webpage(s) | https://www.gpo.gov/fdsys/pkg/GOVPUB-C13-752d1bed8ba5e339a5dbbbe7614cc375/pdf/GOVPUB-C13-752d1bed8ba5e339a5dbbbe7614cc375.pdf |
| Alternate Webpage(s) | https://doi.org/10.1002/https%3A%2F%2Fdx.doi.org%2F10.6028%2FNIST.IR.7234 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |