NDLI: Optimization of GaAs Quantum Nanodisks Fabrication Process by Combination of A Bio-template and Neutral Beam Etching

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Optimization of GaAs Quantum Nanodisks Fabrication Process by Combination of A Bio-template and Neutral Beam Etching

Content Provider	Semantic Scholar
Author	Tamura, Yosuke
Copyright Year	2013
Abstract	[序論] III-V族化合物を用いた量子ドット構造は,レーザや太陽電池など量子効果デバイスとして大きな注目を浴びている.現在,この量子ドットの作製にはボトムアッププロセスが広く用いられており,これまでに分子線エピタキシー(MBE)法による作製を中心に,様々な研究報告がなされている.しかしながら,ボトムアップ法を用いてサイズの均一な量子ドットを作製することは困難である.そこで我々は金属を内包したタンパク質の自己組織化能を用いたバイオテンプレート技術[1]と,ダメージフリートップダウンプロセスである中性粒子ビームエッチング(NBE)[2]を組み合わせたバイオテンプレート極限加工により,量子ナノ構造として量子ナノディスクの作製に成功している.これまでに,有機金属気相成長法(MOVPE) を用いて GaAs/AlGaAs の積層構造を作製し,GaAs ナノディスクを含んだ GaAs/AlGaAs ナノカラムを作製することに成功している.さらに,MOVPE を用いて埋め込み再成長に成功している[3,4].本研究では,高密度 GaAs ナノディスクの作製プロセスの最適化を目指し,エッチング条件の最適化の検討を行った.
File Format	PDF HTM / HTML
Alternate Webpage(s)	https://confit.atlas.jp/guide/event-img/jsap2013a/18a-D6-8/public/pdf?type=in
Language	English
Access Restriction	Open
Content Type	Text
Resource Type	Article

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