NDLI: APPARATUS FOR FORMING THIN FILM ON SEMCONDUCTOR SUBSTRATE BY PLASMA REACTION BACKGROUND OF THE INVENTION 1. Field of the Invention

Content Provider	Semantic Scholar
Author	Nguyen, Dao Hinh
Copyright Year	2017
Abstract	US 2002/0168870 A1 Nov. 14, 2002 A plasma CVD apparatus for forming a thin film on a (51) Int. Cl." .............................................. H01L 21/469 Semiconductor Substrate by plasma reaction includes: (i) a (52) U.S. Cl. ....................... 438/778; 438/488: 438/491; reaction chamber; (ii) a reaction gas inlet for introducing a 438/611 reaction gas into the reaction chamber; (iii) a lower stage on (58) Field of Search 438/488, 491 which a Semiconductor Substrate is placed in the reaction
File Format	PDF HTM / HTML
Alternate Webpage(s)	https://patentimages.storage.googleapis.com/c4/ac/c0/ef83fe1789fbc9/US6602800.pdf
Language	English
Access Restriction	Open
Content Type	Text
Resource Type	Article

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