NDLI: Characteristics of Sub-100 nm High-k Gate Dielectrics MOSFETs With Different Source / Drain Structure

Content Provider	Semantic Scholar
Author	Liu, Xiaoyan Xia, Zhiliang Lou, Shuzuo Guo, Dechao Kang, Jinfeng Han, Ruqi
Copyright Year	2002
Abstract	The characteristics of a typical 70nm high K gate dielectrics MOSFET with different source/drain structure including S/D lift-up structure are simulated by two dimensional device simulator. The impact of FIBL effect the gate dielectric permikttivity increasing to the characteristics of MOSFET is investigated. The simulation results shows that the degradation of MOSFET characteristics can be suppress by change the structure of source/drain such as gate offset and S/D lift-up.
File Format	PDF HTM / HTML
Alternate Webpage(s)	http://www.essderc2002.deis.unibo.it/data/pdf/Liu.pdf
Language	English
Access Restriction	Open
Content Type	Text
Resource Type	Article

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