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PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING THE SAME, METHOD FOR PRODUCING RESIST PATTERN, RESIST PATTERN AND SUBSTRATE HAVING THE RESIST PATTERN LAMINATED THEREON - European Patent Office - EP 1229389 A1
| Content Provider | Semantic Scholar |
|---|---|
| Copyright Year | 2002 |
| Abstract | (71) Applicant: Hitachi Chemical Company, Ltd. Tokyo 163-0449 (JP) (72) Inventors: • SATOU, Kuniaki Hitachi Chemical Co., Ltd. Kashima-gun, Ibaraki 314-0255 (JP) • KUTSUNA, Takahiko Hitachi Chemical Co., Ltd. Kashima-gun, Ibaraki 314-0255 (JP) • YOSHINO, Toshizumi, Hitachi Chemical Co., Ltd. Kashima-gun, Ibaraki 314-0255 (JP) • HIRAYAMA, Takao, Hitachi Chemical Co., Ltd. Kashima-gun, Ibaraki 314-0255 (JP) • UZAWA, Mikio, Hitachi Chemical Co., Ltd. Kashima-gun, Ibaraki 314-0255 (JP) |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | https://patentimages.storage.googleapis.com/ae/09/e4/82f5711b3d12bd/EP1229389A1.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |