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Ion Implantation and Characterisation of Aisi 316l Stainless Steel
Content Provider | Semantic Scholar |
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Copyright Year | 2013 |
Abstract | Ion implantation is a kinetic doping process in which accelerated ions are directed to the surface of target material due to high initial energy typically in the range of 20 to 200 keV. Dearnaley et al (1973) dealt with this energy level in detail. Ions penetrate the surface layer of material, thus losing or dissipating their energy in two types of interactions: elastic collisions with target nuclei and inelastic collisions with the electrons. Carter and Colligon (1968) have dealt with this in detail. Elastic collisions cause displacement of the atoms from their initial positions leading to the accumulation of the radiation damage. |
File Format | PDF HTM / HTML |
Alternate Webpage(s) | https://shodhganga.inflibnet.ac.in/bitstream/10603/11555/8/08_chapter%203.pdf |
Language | English |
Access Restriction | Open |
Content Type | Text |
Resource Type | Article |