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C60-assisted electron-beam lithography for loss reduction in InP membrane waveguides
| Content Provider | Semantic Scholar |
|---|---|
| Author | Jiao, Y. Yuqing Pello, Josselin Smalbrugge, E. Geluk, Ej Erik Jan Smit, Mk Meint Tol, J. Van Der |
| Copyright Year | 2013 |
| Abstract | • A submitted manuscript is the author's version of the article upon submission and before peer-review. There can be important differences between the submitted version and the official published version of record. People interested in the research are advised to contact the author for the final version of the publication, or visit the DOI to the publisher's website. • The final author version and the galley proof are versions of the publication after peer review. • The final published version features the final layout of the paper including the volume, issue and page numbers. |
| Starting Page | 167 |
| Ending Page | 170 |
| Page Count | 4 |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | https://pure.tue.nl/ws/files/3948183/589992532650113.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
