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Optimization of near-field scanning optical lithography
| Content Provider | Semantic Scholar |
|---|---|
| Author | Routley, Ben Holdsworth, John L. Fleming, Andrew J. |
| Copyright Year | 2015 |
| Abstract | This article describes two- and three-dimensional optical simulations for determining optimal conditions for near-field scanning optical lithography. It was found that a combination of 30-nm thick photoresist and 50-nm thick anti-reflective coating will yield optimal results with 405 nm incident light and a hollow-cantilever probe with 100-nm aperture width. In addition to identifying the optimal conditions, the sensitivity of the resolution with respect to each parameter is explored and plotted. The mechanisms behind each trend are described with supporting simulation data. |
| File Format | PDF HTM / HTML |
| DOI | 10.1117/12.2086073 |
| Alternate Webpage(s) | http://www.precisionmechatronicslab.com/wp-content/uploads/2015/05/D15a.pdf |
| Alternate Webpage(s) | https://doi.org/10.1117/12.2086073 |
| Volume Number | 9423 |
| Journal | Advanced Lithography |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
