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Influence of substrate on structural and transport properties of LaNiO 3 thin films prepared by pulsed laser deposition
| Content Provider | Semantic Scholar |
|---|---|
| Author | Cichetto, L. Sergeenkov, Sergei Díaz, José Alberto Longo, Elson Moharrami F. Araújo-Moreira |
| Copyright Year | 2016 |
| Abstract | We report the structural and transport properties of LaNiO3 thin films prepared by pulsed laser deposition technique. To understand the effects of film thickness, lattice mismatch and grain size on transport properties, various oriented substrates were used for deposition, including single-crystalline SrLaAlO4 (001), SrTiO 3 (100) and LaAlO3 (100). To achieve a high quality LaNiO3 thin films, the vital parameters (such as laser fluence, substrate temperature, oxygen pressure, and deposition time) were optimized. The best quality films are found to be well textured samples with good crystalline properties. |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | https://export.arxiv.org/pdf/1708.08352 |
| Language | English |
| Access Restriction | Open |
| Subject Keyword | Chemical vapor deposition Display resolution Oxygen Physical vapor deposition Pulsed laser deposition Thickness (graph theory) Thin-film transistor |
| Content Type | Text |
| Resource Type | Article |