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INTRoDUCTIoN NANOIMPRINT LITHOGRAPHY TECH NOLOGY WITH AUTOMATIC ALIGNMENT *
| Content Provider | Semantic Scholar |
|---|---|
| Author | Hong-Hai, Zhang Xuefang, W. A. N. G. Xiao-Feng, Hu Sheng, Lim Sip |
| Copyright Year | 2007 |
| Abstract | Nanoimprint lithography fNIL1 is recognized as one of the most promising candidates for the next generation lithography fNGL)to obtain sub一1O0 mn patterns because of its simplicity, high.throughput and 1ow.cost. i1e substantia1 efort has been expending on NIL for producing smaller and smaler feature sizes.considerably 1ess efort has been devoted to the equaly important issuealignment between template an d substrate.A homemade prototype nanoimprint lithography too1 with a high precision automatic alignment system based on Moir6 signals is presented.Coarse an d fine pitch gratings are adopted to produce M oir6 signals to contro1 macro and micro actuators an d enable the substrate to move towards the desired position automaticaly.Linear motors with 30 |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | http://star.sstir.cn/upload/attach/attach20090927050005z5bcjg075z.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
