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Silicon electrodeposition in molten fluorides
| Content Provider | Semantic Scholar |
|---|---|
| Author | Bieber, Anne-Laure Massot, Laurent Gibilaro, Mathieu Cassayre, Laurent Taxil, Pierre Chamelot, Pierre |
| Copyright Year | 2012 |
| Abstract | a b s t r a c t Silicon nucleation process was investigated in molten NaF–KF (40–60 mol%) on silver electrodes in the 820–950 ◦ C temperature range in order to optimize silicon coating operating conditions. Chronoam perometric measurements evidenced that silicon electrodeposition process involved an instantaneous nucleation with diffusioncontrolled nuclei growth whatever temperature and Si(IV) ions concentration in the mixture. The overpotential and temperature influence on nucleation sites number was also studied. Silicon deposits were obtained using the same temperature range as nucleation study, for different current densities on substrates: Ni, Ag, Cgraphite and Cvitreous. A sensitive influence of the cathodic substrate on the deposit adherence and roughness was observed and discussed. |
| Starting Page | 282 |
| Ending Page | 289 |
| Page Count | 8 |
| File Format | PDF HTM / HTML |
| DOI | 10.1016/j.electacta.2011.12.039 |
| Volume Number | 62 |
| Alternate Webpage(s) | http://oatao.univ-toulouse.fr/8619/1/8619_Massot.pdf |
| Alternate Webpage(s) | https://doi.org/10.1016/j.electacta.2011.12.039 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
