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Studies on Structural And Optical Properties of DC Reactive Magnetron Sputtered Zro 2 Thin Films
| Content Provider | Semantic Scholar |
|---|---|
| Author | Venkataiah, Sudarshan Uthanna, Suda |
| Copyright Year | 2018 |
| Abstract | This work deals with deposition of zirconium oxide (ZrO2) thin films by DC reactive magnetron sputtering method. ZrO2 films were formed on silicon and quartz substrate held at room temperature by sputtering metallic target of zirconium at different oxygen partial pressures in the range 5x10 -5 6x10 -4 Torr and at a fixed sputter pressure of 3x10 -3 Torr. Effect of oxygen partial pressure on the chemical composition, structure and optical properties of the deposited ZrO2 films was studied. The films formed at oxygen partial pressures ≥ 3x10 -4 Torr were of ZrO2. X-ray diffraction studies revealed that the deposited films were amorphous in nature. Fourier transform infrared absorption studies confirmed the existence of characteristic vibration modes of ZrO2. The films exhibited high optical transmittance in the visible range and fundamental absorption edge shifted towards higher energy side with increase of oxygen partial pressure. Optical band gap of the films increased from 5.32 eV to 5.68 eV and refractive index increased from 1.87 to 2.14 with increase of oxygen partial pressure from 5x10 -5 Torr to 6x10 -4 Torr respectively. |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | http://www.ijerd.com/paper/vol14-issue1/Version-2/E140122532.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
