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Type 3-14-2019 Fabrication of High Aspect Ratio Nanopillars using Metal Assisted Chemical Etching
| Content Provider | Semantic Scholar |
|---|---|
| Author | Chaudhary, Rimjhim Yamamoto, Hiromichi |
| Copyright Year | 2019 |
| Abstract | This report describes fabrication of 100 to 200 nm diameter silicon nanopillars with ~140:1 aspect ratio using Metal Assisted Chemical Etching (MacEtch) process giving a high etch rate of ~930 nm/min, and also discusses an area dependence of the etch uniformity and rate, using 0.5 and 1 μm diameter, and 2 mm x 2 mm Au films. It is found that the etching using the Au film with the area of 0.2 μm2 is uniform, but that with the area of more than 0.8 μm2 is not, suggesting that the diffusion length of the species in MacEtch reaction underneath the Au film is ~300 nm. |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | https://repository.upenn.edu/cgi/viewcontent.cgi?article=1057&context=scn_protocols |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
