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EUV interferometry of a four-mirror ring-field EUV optical system
| Content Provider | Semantic Scholar |
|---|---|
| Author | Goldberg, Kenneth A. Naulleau, Patrick P. Batson, Phillip J. Denham, Paul E. Anderson, Erik H. Bokor, Jeffrey Chapman, Henry N. |
| Copyright Year | 2000 |
| Abstract | At-wavelength, extreme ultraviolet interferometric measurements of a new, four-mirror, ring-field projection optical system have been made. Designed for operation at 13.4- nm wavelength with a 0.1 numerical aperture and a 26 mm field of view at the wafer, the nearly diffraction-limited wavefront quality of the system has been verified interferometrically. After assembly and alignment with visible-light interferometry, the optic was transported to Lawrence Berkeley National Laboratory where the at-wavelength testing with a phase-shifting point diffraction interferometer was performed. Measurement of the system wavefront at a number of points across the field of view reveals the optical performance of the system over its large, ring-field imaging area. |
| File Format | PDF HTM / HTML |
| DOI | 10.1117/12.390045 |
| Volume Number | 3997 |
| Alternate Webpage(s) | https://goldberg.lbl.gov/papers/Goldberg.etal.SPIE3997-119.pdf |
| Alternate Webpage(s) | https://doi.org/10.1117/12.390045 |
| Journal | Advanced Lithography |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
