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Plasma Etching of Delectric Layer with Etch Profile Control Field of the Invention
| Content Provider | Semantic Scholar |
|---|---|
| Copyright Year | 2017 |
| Abstract | (73) Assignee: Lam Research Corporation, Fremont, y A E. th et al. CA (US) 5,882,535 A * 3/1999 Stocks et al. ................. 216/18 6,090,304 A 7/2000 Zhu et al. (*) Notice: Subject to any disclaimer, the term of this 6,114.250 A * 9/2000 Élish et al. ........... 438/709 patent is extended or adjusted under 35 6,117,786 A 9/2000 Khajehnouri et al. U.S.C. 154(b) by 92 days. 6,159,862 A 12/2000 Yamada et al. ............. 438/712 6,191,043 B1 2/2001 McReynolds (21) Appl No.: 09/883,207 6,403,488 B1 * 6/2002 Yang et al. ................. 438/706 y 9 |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | https://patentimages.storage.googleapis.com/97/97/bc/3d95c97cc8d737/US6746961.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |