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Graded nanostructured interfacial layers fabricated by high power pulsed magnetron sputtering — plasma immersion ion implantation and deposition (HPPMS–PIII&D)
| Content Provider | Semantic Scholar |
|---|---|
| Author | Wu, Zhongzhen Tian, Xiubo Gong, Chunzhi Yang, Shiqin Chu, Kunmo |
| Copyright Year | 2013 |
| Abstract | article i nfo A nanostructured interfacial layer with a graded structure is produced by hybrid high-power pulsed magnetron sputtering-plasma immersion ion implantation and deposition (HPPMS-PIII&D) to improve adhesion of multi- functional coatings. As a demonstration, a ceramic CrN film is prepared on stainless steel together with a Cr interlayer. High-resolution transmission electron microscopy (HR-TEM) reveals the presence of a 40 nm thick nanostructured interfacial layer between the Cr interlayer and substrate with gradually changing compositions, and this layer which possesses a dense and pore/void free structure is responsible for the strong film adhesion. The hybrid technology combines the benefits of both the HPPMS and PIII&D enabling fabrication of functional films with the desired properties. The technique and fabrication strategy have many potential applications in photovoltaics, energy storage, tribology, lubrication, aeronautics, and astronautics. © 2013 Published by Elsevier B.V. |
| Starting Page | 320 |
| Ending Page | 325 |
| Page Count | 6 |
| File Format | PDF HTM / HTML |
| DOI | 10.1016/j.surfcoat.2013.10.007 |
| Volume Number | 236 |
| Alternate Webpage(s) | http://www6.cityu.edu.hk/appkchu/Publications/2013/13.108.pdf |
| Alternate Webpage(s) | http://sam.pkusz.edu.cn/uploads/kind/file/20150704/20150704101051_58881.pdf |
| Alternate Webpage(s) | https://doi.org/10.1016/j.surfcoat.2013.10.007 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
