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Estudo Do Processo De Implantação Iônica Por Imersão Em Plasma Com Campo Magnético Externo
| Content Provider | Semantic Scholar |
|---|---|
| Author | Pillaca, Elver Juan Dos Dias Mitma Kostov, Konstantin Georgiev |
| Copyright Year | 2007 |
| Abstract | Plasma Immersion ion Implantation (PIII) is a novel technique frequently employed for surface modification of diverse materials. The usage of a static magnetic field during this treatment may offer various advantages in respect to the conventional PIII process. The application of a transverse magnetic field produces a system of crossed ExB fields around the target which leads to increasing of plasma density and consequent reduction of plasma sheath expansion. The operation of a cylindrical PIII vessel with crossed ExB fields is investigated by means of 2D computer code KARAT. In this simulation the transversal magnetic field is produced by a couple of coils installed outside the vacuum chamber. In the present work we have focused our attention on the effect of residual gas pressure on the ion current to the target, in a magnetic field enhanced PIII system. |
| Starting Page | 69 |
| Ending Page | 73 |
| Page Count | 5 |
| File Format | PDF HTM / HTML |
| DOI | 10.17563/rbav.v26i2.22 |
| Alternate Webpage(s) | http://www.sbvacuo.org.br/rbav/index.php/rbav/article/download/22/19 |
| Alternate Webpage(s) | https://doi.org/10.17563/rbav.v26i2.22 |
| Volume Number | 26 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
