Produção De Superfícies Seletivas Por Magnetron Sputtering Para Aplicações Fototérmicas

Content Provider	Semantic Scholar
Author	Sade, Wagner Tiradentes, Praça
Copyright Year	2008
Abstract	In this present work, selective surfaces with Ni and NiO had been produced in chamber of vacuum with the use of cathodic deposition ("sputtering"). The pressure of the chamber was adjusted in 2x10 -2 mbar and the power 600W. The time for deposition of Ni varied of 10 to 60 minutes and the time for deposition of Ni-NiO of 10 to 90 minutes. The mixture of gases was constituted of argon (inert gas) and oxygen (active gas). The percentage in volume of oxygen varied of 20 to 70%. The identification and the quantifica- tion of the phases were carried through by X-Ray Diffrac- tion (XRD). The microstructure of the samples was exam- ined to the Scanning Eletronic Microscope (SEM). The sur- face morphology was investigated by Atomic Force Micro- scope (AFM). The solar absortance was calculated from the measures of reflectance for Spectroscopy for Fourier Transformed Infrared Ray (FTIR). In some samples peaks of 99% of thermal absorption had been reached. Films with better absorption of heat for applications in solar collec- tors, was prepared with the relation of the chemical com- position, microstructure and the optic properties of these materials.
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Alternate Webpage(s)	http://www.sbvacuo.org.br/rbav/index.php/rbav/article/download/54/453
Language	English
Access Restriction	Open
Content Type	Text
Resource Type	Article