NDLI: Impact of time dependent dielectric breakdown and stress-induced leakage current on the reliability of high dielectric constant (Ba,Sr)TiO/sub 3/ thin-film capacitors for Gbit-scale DRAMs

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Impact of time dependent dielectric breakdown and stress-induced leakage current on the reliability of high dielectric constant (Ba,Sr)TiO/sub 3/ thin-film capacitors for Gbit-scale DRAMs

Content Provider	Semantic Scholar
Author	Yamamichi, Shintaro Yamamichi, Akiko Park, Donggun King, Tsu-Jae Hu, Chenming Calvin
Copyright Year	1999
Abstract	Time dependent dielectric breakdown (TDDB) and stress-induced leakage current (SILC) are investigated for the reliability of (Ba,Sr)TiO/sub 3/ (BST) thin films. Both time to breakdown (T/sub BD/) versus electric field (E) and T/sub BD/ versus 1/E plots show universal straight lines, independent of the film thickness, and predict lifetimes longer than 10 y at +1 V for 50 nm BST films with an SiO/sub 2/ equivalent thickness of 0.70 nm. SILC is observed at +1 V after electrical stress of BST films; nevertheless, 10 y reliable operation for Gbit-scale DRAMs is predicted in spite of charge loss by SILC. Lower (Ba+Sr)/Ti ratio is found to be strongly beneficial for low leakage, low SILC, long TBD, and therefore greater long-term reliability. This suggests a worthwhile tradeoff against the dielectric constant, which peaks at a (Ba+Sr)/Ti ratio of 1.05.
Starting Page	342
Ending Page	347
Page Count	6
File Format	PDF HTM / HTML
DOI	10.1109/16.740900
Volume Number	46
Alternate Webpage(s)	https://people.eecs.berkeley.edu/~hu/PUBLICATIONS/Hu_papers/Hu_Melvyl/Hu_Melvyl_99_26.pdf
Alternate Webpage(s)	https://doi.org/10.1109/16.740900
Language	English
Access Restriction	Open
Content Type	Text
Resource Type	Article

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