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Ion-implantation induced anomalous surface amorphization in silicon
| Content Provider | Semantic Scholar |
|---|---|
| Author | Lohner, Tivadar Fried, M. Vedam, K. Nguyen, N. V. Hanekamp, L. J. Silfhout, Arend Van |
| Copyright Year | 2002 |
| Abstract | T. Lohner a**, E. K&ai a, N.Q. Kh6nh a, Z. T6th b, M. Fried a, K. Vedam ‘, N.V. Nguyen ‘, L.J. Hanekamp d, A. van Silfhout d a Joint Chair for Experimental Physics of Technical University Budapest and RFkI Research Institute for Mater&Is Science, P.O.B. 49, H-1525 Budapest, Hungary b TUNGSRAM Co. Ltd., Brady I. Research Center, V&i lit 77., H-1340 Budapest, IV, Hungary ’ Materials Research Laboratory, Pennsylvania State University, University Park, PA 16802, USA d Faculty of Applied Physics, University of Twente, P. O.B. 217, 7500 AE Enschede, The Netherlands |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | https://ris.utwente.nl/ws/portalfiles/portal/6508508/Lohner94ion.pdf |
| Language | English |
| Access Restriction | Open |
| Subject Keyword | A* search algorithm Checking (action) Curve fitting Forty Nine GeForce 7 series Ion implantation Ions Silicon Thickness (graph theory) funding grant iRex iLiad |
| Content Type | Text |
| Resource Type | Article |