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Laser-assisted Molecular Beam Deposition Technology Combinatorial Pulsed Laser Deposition for Rapid Exploration of Novel Electronic Materials Material Deposition by Pulsed Laser Ablation Methods Pulsed Laser Deposition's Changing Face the Science of the Lambd Process Laser-assisted Molecular Beam De
| Content Provider | Semantic Scholar |
|---|---|
| Author | Chokshi, Sagar DeLeon, Robert L. Tompa, Gary S. Garvey, James F. |
| Abstract | journal published biannually by Lambda Physik. This publication helps keep laser users, scientists, and engineers apprised of the latest advances and emerging technologies in the UV laser field. For over 17 years, Highlights has kept professionals informed about new breakthroughs , applications, and work our customers are doing. subscription Highlights is a free publication published and distributed to10,000 qualified professionals by Lambda Physik. If you would like to subscribe to Highlights, send us an email at marcom@lambdaphysik.com and in the subject field write: Highlights subscription. Please indicate whether you would like to receive a hard copy or a PDF version. For your convenience , you can download previous PDF editions of Highlights from our website at www.lambdaphysik.com. publishing opportunities We are now accepting articles to be published in upcoming issues of Highlights. Authors interested in submitting an abstract should contact the editor at marcom@lambda-Tech. The physics of the technique employs a standard Lambda Physik pulsed excimer laser to ablate a pure metal target. The laser ablation creates high-temperature plasma of metal vapor into which oxygen gas is directly pulsed, which then chemically produces a molecular beam of the corresponding metal oxide. This technique has been used to deposit thin, particulate-free, conformal layers of several materials. We herein review redeposition of high-K dielectrics, such as HfO 2 , on Si, providing a potential solution for reducing the equivalent oxide thickness to less than 10 angstroms for the gates of CMOS devices. Importantly, this technique can produce high-quality films at low temperatures, thus allowing the use of plastic substrates. The combinatorial approach to materials is a new way to rapidly explore novel materials phases. In this article, we describe the use of pulsed-laser, thin-film deposition techniques for the synthesis of combinatorial libraries of electronic thin-film materials. The combinatorial thin-film deposition flange is used to generate combinatorial libraries of a variety of materials systems. Pulsed Laser Ablation (PLA) is widely recognized as a simple, but versatile method for depositing thin films and fabricating multi-layer structures. Superficially, the technique is conceptually simple. However, this apparent simplicity hides a wealth of fascinating, and only partially understood, chemical physics. Pulsed Laser Deposition (PLD) is an extraordinarily versatile thin-film, physical-vapor deposition technique. In this Lambda Highlight, we briefly describe the ways in which the conventional technique has been extended from metal and ceramic oxides to include organics, polymers, and biomaterials. As such, PLD is a thin-film deposition … |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | http://www.lambdaphysik.com/pdf/pdf_297.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
