Loading...
Please wait, while we are loading the content...
Similar Documents
Chemical–Mechanical Polishing of CdTe and ZnxCd1−xTe Single Crystals by H2O2(HNO3)–HBr–Organic Solvent Etchant Compositions
| Content Provider | Semantic Scholar |
|---|---|
| Author | Tomashik, Z. F. Tomashik, V. M. Stratiychuk, I. B. Okrepka, G. M. Hnativ, I. I. Moravec, Pavel Hoeschl, P. |
| Copyright Year | 2009 |
| Abstract | Chemical–mechanical polishing of CdTe and ZnxCd1−xTe single-crystal surfaces by bromine-evolving compositions based on aqueous solutions of H2O2(HNO3)–HBr–solvent has been investigated. The dependences of the chemical–mechanical polishing rate on the dilution of the base polishing etchant for various organic components have been determined. The surface condition after such polishing has been investigated using profilometry. The polishing etchant compositions for CdTe and ZnxCd1−xTe single-crystal surfaces and the chemical polishing conditions have been optimized. |
| Starting Page | 1637 |
| Ending Page | 1644 |
| Page Count | 8 |
| File Format | PDF HTM / HTML |
| DOI | 10.1007/s11664-009-0692-8 |
| Alternate Webpage(s) | https://page-one.springer.com/pdf/preview/10.1007/s11664-009-0692-8 |
| Alternate Webpage(s) | https://doi.org/10.1007/s11664-009-0692-8 |
| Volume Number | 38 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |