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Electrodeposition of Chromium Coatings from a Choline Chloride Based Ionic Liquid with the Addition of Water
| Content Provider | Semantic Scholar |
|---|---|
| Author | Protsenko, Vyacheslav S. Bobrova, L. S. Baskevich, Alexander Korniy, S. A. Danilov, Felix I. |
| Copyright Year | 2018 |
| Abstract | Chromium electrodeposition process was studied using a trivalent chromium plating bath on the basis of ionic liquid which consists of choline chloride, chromium (III) chloride and water additive in 2.5:1:x molar ratio, where x = 6, 9, 12, 15 or 18. Cyclic voltammetry revealed that the increasing extra water content in the liquid mixtures causes the acceleration of hydrogen evolution reaction, and, consequently, the reduction of current efficiency of chromium electrodeposition. The favorable effect of extra water addition is associated with an increase in conductivity and a decrease in the electrolyte viscosity. The most suitable water content in ionic liquids seems to be in the range of x = 9 to x = 15. The current efficiency of chromium deposition increases with increasing the current density and decreasing the temperature, thus reaching 40 50 % in some cases. The choline chloride based ionic liquids with the addition of extra water allow obtaining uniform and bright chromium coatings with an amorphous type microstructure and nodular structure of the surface. The chromium plating baths under consideration can be used for the production of relatively thick chromium deposits (with a thickness of several tens microns) with microhardness close to the values required for industrial “hard chrome”. |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | https://dl.uctm.edu/journal/node/j2018-5/15_17-130_p906-915.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
