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Fabrication of high-aspect-ratio micro structures using uv-liga technology
| Content Provider | Semantic Scholar |
|---|---|
| Author | Nguyễn, Thị Minh Hằng Chien-Hung, Ho Vu, Ngoc Hung Nguyen, P. T. A. |
| Copyright Year | 2005 |
| Abstract | Thanks to almost transparent property of SU8 for wavelength of 365- 400nm, UV-LIGA technology using this photoresist has been applied to fabricate high-aspect-ratio (HAR) microstructures. This allows transferring patterns with vertical sidewall from masks to the photoresist. This paper introduces UV-LIGA and its application in fabricating comb drive structure for an angular rate sensor of linewidth and thickness of 50µm and 120µm, respectively. |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | http://tainguyenso.vnu.edu.vn/jspui/bitstream/123456789/470/1/Bai_3.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |