NDLI: Process and Apparatus for Removing Residues from Semconductor Substrates Field of the Invention

Content Provider	Semantic Scholar
Copyright Year	2017
Abstract	The present invention generally relates to a System for cleaning Substrates. More particularly, the present invention relates to process(es) for effecting chemical removal of residues from Semiconductor Substrates, including Silicon wafers, using a System of reactive reverse micelle(s) or microemulsions in a densified carbon dioxide matrix. Vari ous reactive chemical agents in the reactive micelle System may be used to effect cleaning and removal of etch and metal residues to levels Sufficient for commercial wafer production and processing.
File Format	PDF HTM / HTML
Alternate Webpage(s)	https://patentimages.storage.googleapis.com/40/1b/b9/cbaf0a09ee57dc/US20050183740A1.pdf
Language	English
Access Restriction	Open
Content Type	Text
Resource Type	Article

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