Surface Texturing for Silicon Solar Cells Using Reactive Ion Etching Technique

Content Provider	Semantic Scholar
Author	Kumaravelu, Giridharan
Copyright Year	2009
Abstract	Surface texturing is an effective and more lasting technique in reducing reflections and improving light trapping compared to antireflection coatings. A surface texturing technique using Reactive Ion Etching (RIE) method suitable for crystalline and multi crystalline solar cells, which resuited in surfaces wRh negligible reflection in the visible band is descdbed. Different texturing structures (pillars. holes and black silicon) have been studied and compared in the wavelength range From 250nm-2500nm. It is found that the reflectance of the textured column structures were less than 0.4% at wavelengths from 500nm to lOOOnm and showed a minimum of 0.29?4 at 1000 nm while the reflectivity from black silicon is around 1% and hole structures is around 6.8% in the same wavelength range.
File Format	PDF HTM / HTML
Alternate Webpage(s)	https://ir.canterbury.ac.nz/bitstream/handle/10092/3383/12585165_surface%20texturing.pdf;sequence=1
Language	English
Access Restriction	Open
Subject Keyword	Electron hole Ions Less Than Numerous One Thousand Reflection (computer graphics) Silicon Solar cell Texture mapping wavelength
Content Type	Text
Resource Type	Article