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TaAl-N Thin Film Prepared by Radio Frequency and Direct Current Reactive Sputtering
| Content Provider | Semantic Scholar |
|---|---|
| Author | Okano, Yukiko Tajiri, Shuichi Aozono, Takashi Okamoto, Akio Ogawa, Soichi Mima, Hiroshi |
| Copyright Year | 2008 |
| Abstract | TaAlN Thin Film Prepared by Radio Frequency and Direct Current Reactive Sputtering Yukiko OKANO1, Shuichi TAJIRI1, Takashi AOZONO1, Akio OKAMOTO2, Soichi OGAWA3 and Hiroshi MIMA3 1Okano Works, Ltd., 168 Taima-cho, Neyagawa, Osaka, 5720078 2Technology Research Institute of Osaka Prefecture, 271 Ayumino, Izumi, Osaka, 5941157 3Ogawa Creation Research Laboratory, 7187 Kariguchidai, Tarumi, Kobe, 6550049 4Osaka City University, 33138 Sugimoto, Sumiyoshi, Osaka, 5588585 |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | https://www.jstage.jst.go.jp/article/jvsj2/51/3/51_3_208/_pdf/-char/ja |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |