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Molecular-beam epitaxial growth of insulating AlN on surface-controlled 6H-SiC substrate by HCl gas etching
| Content Provider | Semantic Scholar |
|---|---|
| Author | Onojima, Norio Suda, Jun Matsunami, Hiroyuki |
| Copyright Year | 2002 |
| Abstract | Insulating AlN layers were grown on surface-controlled 6H–SiC subtrates by molecular-beam epitaxy (MBE) using elemental Al and rf plasma-excited nitrogen (N*). HCl gas etching was introduced as an effective pretreatment method of substrate for MBE growth of AlN. 6H–SiC substrates pretreated by HCl gas etching had no surface polishing scratches and an atomically flat surface. In addition, evident (∛×∛)R30° surface reconstruction was observed even before thermal cleaning. AlN layers grown on this substrate had no defects related to surface polishing scratches and excellent insulating characteristics. |
| Starting Page | 76 |
| Ending Page | 78 |
| Page Count | 3 |
| File Format | PDF HTM / HTML |
| DOI | 10.1063/1.1428620 |
| Volume Number | 80 |
| Alternate Webpage(s) | https://repository.kulib.kyoto-u.ac.jp/dspace/bitstream/2433/24205/1/ApplPhysLett_80_76.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |