Loading...
Please wait, while we are loading the content...
Similar Documents
Thin crystalline functional group copolymer poly(vinylidene fluoride–trifluoroethylene) film patterning using synchrotron radiation
| Content Provider | Semantic Scholar |
|---|---|
| Author | Choi, Jaewu Manohara, Harish M. Morikawa, Eizi Sprunger, Phillip T. Dowben, Peter A. Palto, Sergei P. |
| Copyright Year | 2000 |
| Abstract | The photodegradation mechanism due to synchrotron radiation exposure of crystalline poly[vinylidene fluoride–trifluoroetylene, P(VDF–TrFE)] copolymer thin films has been studied with ultraviolet photoemission spectroscopy (UPS) and mass spectroscopy. Upon increasing exposure to x-ray white light (hν⩽1000 eV), UPS measurements reveal that substantial chemical modifications occur in P(VDF–TrFE) 5 monolayer films, including the emergence of new valence band features near the Fermi level, indicating a semimetallic photodegradeted product. The photodetached fragments of the copolymer consist mainly of H2, HF, CHF, CH2. This x-ray exposure study demonstrates that P(VDF–TrFE) films, possessing unique technologically important properties, can be directly patterned by x-ray lithographic processes. |
| Starting Page | 381 |
| Ending Page | 383 |
| Page Count | 3 |
| File Format | PDF HTM / HTML |
| DOI | 10.1063/1.125760 |
| Volume Number | 76 |
| Alternate Webpage(s) | http://digitalcommons.unl.edu/cgi/viewcontent.cgi?article=1033&context=physicsdowben |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
