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Sub-micron silicon nitride waveguide fabrication using conventional optical lithography.
| Content Provider | Semantic Scholar |
|---|---|
| Author | Huang, Yuewang Zhao, Qiancheng Kamyab, Lobna Mathur, Sanjay Capolino, Filippo Boyraz, Ozdal |
| Copyright Year | 2015 |
| Abstract | We demonstrate a novel technique to fabricate sub-micron silicon nitride waveguides using conventional contact lithography with MEMS-grade photomasks. Potassium hydroxide anisotropic etching of silicon facilitates line reduction and roughness smoothing and is key to the technique. The fabricated waveguides is measured to have a propagation loss of 0.8dB/cm and nonlinear coefficient of γ = 0.3/W/m. A low anomalous dispersion of <100ps/nm/km is also predicted. This type of waveguide is highly suitable for nonlinear optics. The channels naturally formed on top of the waveguide also make it promising for plasmonics and quantum efficiency enhancement in sensing applications. |
| Starting Page | 530 |
| Ending Page | 536 |
| Page Count | 7 |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | http://apdsl.eng.uci.edu/RecentJournals/Sub-micron%20silicon%20nitride%20waveguide%20fabrication%20using%20conventional%20optical%20lithography.pdf |
| Alternate Webpage(s) | http://apdsl.eng.uci.edu/RecentConferences/Sub-micron%20silicon%20nitride%20waveguide%20fabrication%20using%20conventional%20optical%20lithography.pdf |
| PubMed reference number | 25836896v1 |
| Alternate Webpage(s) | https://doi.org/10.1364/OE.23.006780 |
| DOI | 10.1364/oe.23.006780 |
| Journal | Optics express |
| Volume Number | 23 |
| Issue Number | 5 |
| Language | English |
| Access Restriction | Open |
| Subject Keyword | Coefficient Hydroxide Ion Micron Optics Potassium Hydroxide Silicon Silicon:SCnt:Pt:Tiss:Qn Smoothing (statistical technique) Waveguide Device Component |
| Content Type | Text |
| Resource Type | Article |
