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Tensile Stress Effect on Indium Diffusion in Silicon Substrate: Ab-initio Study
| Content Provider | Semantic Scholar |
|---|---|
| Author | Kim, Young-Kyu Park, Soon-Yeol Won, Taeyoung |
| Copyright Year | 2008 |
| Abstract | In this paper, we present our ab-initio study on energy configurations, minimum energy path (MEP), and migration energy for neutral indium diffusion in a uniaxial and biaxial tensile strained {100} silicon layer. Our abinitio calculation of the electronic structure allowed us to figure out transient atomistic configurations during the indium diffusion in strained silicon. We found that the lowest-energy structure (InS - Sii Td ) consists of indium |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | http://www.nsti.org/publications/Nanotech/2008/pdf/562.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |