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Hybrid materials : a bottom-up approach for nanotechnology applications
| Content Provider | Semantic Scholar |
|---|---|
| Author | Brigo, Laura Zanchetta, Erika Giustina, Gioia Della Brusatin, Giovanna |
| Copyright Year | 2014 |
| Abstract | Fabricating small-scale devices, such as sensors and high index waveguides, requires patterning of a substrate surface with microand nanostructures. To achieve this, lithographers generally use indirect techniques. For example, to form structures in an organic or inorganic material, the developer may pattern and deposit a sacrificial resist and then transfer the image of that layer to the functional material. However, such multi-step processes often cause a deterioration in lithographic performance and are time-consuming and complicated. An alternative approach, taken to pattern inorganic films, attempts to simplify the process using an organic resist pattern as a mold. This technique involves depositing the film on the mold and then removing the resist by a lift-off procedure, leaving the patterned structures on the substrate. The quality of the resist materials is, therefore, essential to the performance of the main lithographic tools in a standard process. Furthermore, it can be strategically relevant for nanotechnology applications in the final device materials, for example, in the optically active nanostructures integrated in microfluidic chips.1 One emerging alternative to organic polymers for microand nanolithography is the use of organic–inorganic hybrid materials. These are cost-effective and enable improved lithographic performance. They offer stability and a wider choice of properties, including thermal and mechanical resistance and chemical endurance. Moreover, it is possible to tune the characteristics of these materials, such as porosity as well as optical and electrical properties, and we can achieve specific functions by embedding nanoparticles, dyes, or other active molecules in the Figure 1. Main building blocks of the hybrid material resist structure. (a) Metal organic precursors, examples of organically modified silicon alkoxide with (b) organic polymerizable function, or (c) organic modifier function. (d) Example of organic monomer and (e) organic molecules added to pattern the film by photopolymerization or photodegradation. |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | http://www.spie.org/documents/Newsroom/Imported/005597/005597_10.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
