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ac impedance techniques to study oxidation process of tunnel barriers in CoFe – AlO x – CoFe magnetic tunnel junctions
| Content Provider | Semantic Scholar |
|---|---|
| Author | Huanga, J. C. A. |
| Copyright Year | 2005 |
| Abstract | ac impedance techniques to study oxidation process of tunnel barriers in CoFe–AlOx–CoFe magnetic tunnel junctions J. C. A. Huang Department of Physics, National Cheng Kung University, Tainan 701, Taiwan, Republic of China, Department of Applied Physics, National University of Kaohsiung, Kaohsiung 811, Taiwan, Republic of China, and Taiwan SPIN Research Center, National Chung Cheng University, Chiayi 621, Taiwan, Republic of China |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | http://ir.lib.ncku.edu.tw/bitstream/987654321/99546/1/2010201401067.pdf |
| Alternate Webpage(s) | http://www.phys.ncku.edu.tw/~mbelab/paper/journal/75.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |