NDLI: Spray Coating of AZ 4562 Photoresist for MEMS applications

Content Provider	Semantic Scholar
Author	Pham, Nga P. Sarro, P. M. Burghartz, Joachim N.
Copyright Year	2017
Abstract	This paper presents a new method of photoresist deposition, spray coating, that utilizes the Electronic Vision EV101 system. Several solution of diluted AZ4562 photoresist are used to form a thick layer on flat wafers and to produce sufficient coverage on wafers with deep cavities. A number of parameters that strongly influence the spray process are identified and their influence on resist thickness and uniformity is evaluated. Special attention is paid to the coating process when spraying on wafers with cavities ranging from 75 to 425μm in depth. A few applications of spray coating are shown to illustrate its possibilities for MEMS. Keyword – resist spray coating, lithography for MEMS, MEMS for RF, micromachining
File Format	PDF HTM / HTML
Alternate Webpage(s)	https://www.ims-chips.de/publication/exe/show_pdfbyid.php/Spray_coatin__of_AZ4562_photoresist_for_MEMS_konf.pdf?doctyp=1&publicationid=505&redirect=2
Language	English
Access Restriction	Open
Content Type	Text
Resource Type	Article

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